Open AccessDigitally tunable holographic lithography using a spatial light modulator as a programmable phase mask
Author(s) -
Jeff Lutkenhaus,
David George,
Mojtaba Moazzezi,
Usha Philipose,
Yuankun Lin
Publication year - 2013
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.026227
Subject(s) - spatial light modulator , holography , optics , lithography , materials science , interference lithography , maskless lithography , phase modulation , phase (matter) , interference (communication) , diffraction , spatial frequency , optical modulator , metamaterial , photolithography , talbot effect , electron beam lithography , photonics , optoelectronics , fabrication , resist , physics , computer science , nanotechnology , phase noise , channel (broadcasting) , alternative medicine , computer network , pathology , layer (electronics) , quantum mechanics , medicine
In this paper, we study tunable holographic lithography using an electrically addressable spatial light modulator as a programmable phase mask. We control the phases of interfering beams diffracted from the phase pattern displayed in the spatial light modulator. We present a calculation method for the assignment of phases in the laser beams and validate the phases of the interfering beams in phase-sensitive, dual-lattice, and two-dimensional patterns formed by a rotationally non-symmetrical configuration. A good agreement has been observed between fabricated holographic structures and simulated interference patterns. The presented method can potentially help design a gradient phase mask for the fabrication of graded photonic crystals or metamaterials.