Open AccessDesign of non-polarizing cut-off filters based on dielectric-metal-dielectric stacks
Author(s) -
Qing-Yuan Cai,
Hai-Han Luo,
Yuanzhou Zheng,
Dingquan Liu
Publication year - 2013
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.019163
Subject(s) - dielectric , materials science , optics , polarizing filter , polarization (electrochemistry) , optical filter , oblique case , linear polarization , optoelectronics , laser , physics , linguistics , chemistry , philosophy
Cut-off filters are usually operating at oblique incidence and exhibit polarization dependence properties. We propose a simple approach to design cut-off filters with low linear polarization sensitivity (LPS) based on dielectric-metal-dielectric (DMD) stacks. The designing method is derived from the theory of optical film characteristic matrix. The admittance loci of the film are adjusted to achieve similar spectral properties of s- and p-polarized light at oblique incidence. Different film structures are designed non-polarizing at different angles of incidence with the method. The results show that the designing method is efficient for designing non-polarizing cut-off filters, which are widely used in non-polarizing optical system.