Parametric model of the Mueller matrix of a Spectralon white reflectance standard deduced by polar decomposition techniques
Author(s) -
Morten Kildemo,
Jérôme Maria,
Pål Gunnar Ellingsen,
M. S. Lars
Publication year - 2013
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.018509
Subject(s) - mueller calculus , optics , scattering , rayleigh scattering , achromatic lens , physics , wavelength , light scattering , stokes parameters , polarimetry , polarization (electrochemistry) , refractive index , matrix (chemical analysis) , materials science , chemistry , composite material
Decomposition methods have been applied to in-plane Mueller matrix ellipsometric scattering data of the Spectralon reflectance standard. Data were measured at the wavelengths 532 nm and 1500 nm, using an achromatic optimal Mueller matrix scatterometer applying a photomultiplier tube and a high gain InGaAs detector for the two wavelengths. A parametric model with physical significance was deduced through analysis of the product decomposed matrices. It is found that when the data are analyzed as a function of the scattering angle, similar to particle scattering, the matrix elements are largely independent of incidence angle. To the first order, we propose that a Guassian lineshape is appropriate to describe the polarization index, while the decomposed diagonal elements of the retardance matrix have a form resembling Rayleigh single scattering. New models are proposed for the off diagonal elements of the measured Mueller matrix.
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