Open AccessEnhanced refractive index sensitivity of elevated short-range ordered nanohole arrays in optically thin plasmonic Au films
Author(s) -
Vladimir E. Bochenkov,
Maj Frederiksen,
Duncan S. Sutherland
Publication year - 2013
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.014763
Subject(s) - materials science , refractive index , plasmon , optics , electron beam lithography , substrate (aquarium) , lithography , electric field , surface plasmon , fabrication , optoelectronics , thin film , layer (electronics) , resist , nanotechnology , medicine , oceanography , physics , alternative medicine , quantum mechanics , pathology , geology
A simple development of the colloidal lithography technique is demonstrated for fabrication of perforated plasmonic metal films elevated above the substrate surface. The bulk refractive index sensitivity of short-range ordered nanohole arrays in 20 nm thick Au films exhibits an increase of up to 37% due to reduction of substrate effect caused by lifting with a 40 nm silica layer. Analysis of the local electric field distribution suggests that the sensitivity increase is due to revealing of the enhanced field near the holes.