Open AccessHighly efficient color filter array using resonant Si_3N_4 gratings
Author(s) -
Mohammad Jalal Uddin,
Robert Magnusson
Publication year - 2013
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.012495
Subject(s) - materials science , grating , optics , color gel , rigorous coupled wave analysis , optoelectronics , color filter array , diffraction grating , lithography , optical filter , fabrication , silicon nitride , silicon , wavelength , nanoimprint lithography , photolithography , medicine , physics , alternative medicine , layer (electronics) , pathology , thin film transistor , composite material
We demonstrate the design and fabrication of a highly efficient guided-mode resonant color filter array. The device is designed using numerical methods based on rigorous coupled-wave analysis and is patterned using UV-laser interferometric lithography. It consists of a 60-nm-thick subwavelength silicon nitride grating along with a 105-nm-thick homogeneous silicon nitride waveguide on a glass substrate. The fabricated device exhibits blue, green, and red color response for grating periods of 274, 327, and 369 nm, respectively. The pixels have a spectral bandwidth of ~12 nm with efficiencies of 94%, 96%, and 99% at the center wavelength of blue, green, and red color filter, respectively. These are higher efficiencies than reported in the literature previously.