Open AccessMlines characterization of the refractive index profile of SiGe gradient waveguides at 215 µm
Author(s) -
Pierre Barritault,
M. Brun,
P. Labeye,
Olivier Lartigue,
JeanMichel Hartmann,
S. Nicoletti
Publication year - 2013
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.011506
Subject(s) - refractive index , materials science , optics , germanium , characterization (materials science) , alloy , high refractive index polymer , optoelectronics , silicon , physics , nanotechnology , composite material
SiGe alloys present a large Infra-Red transparency window and a full compatibility with the standard Complementary Metal Oxide Semiconductor processing making them suitable for applications in integrated optics. In this paper we report on Mlines characterization of Si(1-x)Ge(x) graded index waveguides at 2.15 µm. First, a law giving the refractive index of a Si(1-x)Ge(x) alloy as a function of the Ge content x: n = 1.342x(2) + 0.295x + 3.451, has been experimentally established in the 0 < x < 0.4 range. Then, we have demonstrated that our methodology based on Mlines measurements can be used as short-loop non-destructive technique to provide feedback for sample growth.