Sub-100nm pattern generation by laser direct writing using a confinement layer | Zendy

Jan-Hendrik Klein-Wiele | Zendy; Péter Simon | Zendy

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Sub-100nm pattern generation by laser direct writing using a confinement layer

Author(s) -

Jan-Hendrik Klein-Wiele,

Péter Simon

Publication year - 2013

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.21.009017

Subject(s) - materials science , optics , wavelength , laser , layer (electronics) , image resolution , nanostructure , irradiation , optoelectronics , nanotechnology , physics , nuclear physics

A novel technique is introduced that dramatically increases the quality and spatial resolution of directly ablated periodic nanostructures on materials. The presented method utilizes a PMMA confinement layer spin coated on the surface of the ablated material reducing the violence and speed of expansion of the molten material. As a result, droplet formation deteriorating the achievable resolution can be completely avoided. Moreover, motion control of the molten material leads to structural details with dimensions well below the irradiation wavelength.

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