Open AccessSub-100nm pattern generation by laser direct writing using a confinement layer
Author(s) -
Jan-Hendrik Klein-Wiele,
Péter Simon
Publication year - 2013
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.009017
Subject(s) - materials science , optics , wavelength , laser , layer (electronics) , image resolution , nanostructure , irradiation , optoelectronics , nanotechnology , physics , nuclear physics
A novel technique is introduced that dramatically increases the quality and spatial resolution of directly ablated periodic nanostructures on materials. The presented method utilizes a PMMA confinement layer spin coated on the surface of the ablated material reducing the violence and speed of expansion of the molten material. As a result, droplet formation deteriorating the achievable resolution can be completely avoided. Moreover, motion control of the molten material leads to structural details with dimensions well below the irradiation wavelength.