Open AccessA nanoscale conical polymethyl methacrylate (PMMA) sub-wavelength structure with a high aspect ratio realized by a stamping method
Author(s) -
Dae-Seon Kim,
Dong-Hyun Kim,
JaeHyung Jang
Publication year - 2013
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.008450
Subject(s) - materials science , aspect ratio (aeronautics) , optics , transmittance , electron beam lithography , lithography , stamping , conical surface , etching (microfabrication) , silicon , wavelength , polymethyl methacrylate , nanoscopic scale , resist , optoelectronics , composite material , nanotechnology , polymer , physics , layer (electronics) , metallurgy
A high aspect ratio conical sub-wavelength structure (SWS) was designed by using rigorous coupled-wave analysis (RCWA) method and was realized on polymethyl methacrylate (PMMA) film using a stamping technique. The silicon template containing a hexagonal array of conical holes with a period of 350 nm and an aspect ratio of 2.8 was fabricated by electron-beam (e-beam) lithography followed by a two-step etching process. The SWS with a high aspect ratio was easily transferred from the fabricated silicon template to PMMA film using the stamping method. The replicated PMMA SWS has an array of cones with nanoscale tips and an aspect ratio higher than 2.8. The average reflectance and transmittance of the PMMA film with the conical SWS in the wavelength ranging from 500 and 1500 nm was improved from 7.1 and 91.1% to 4.3 and 94.2%, respectively, as compared to flat PMMA film.