Open AccessThird-harmonic UV generation in silicon nitride nanostructures
Author(s) -
Tingyin Ning,
Outi Hyvärinen,
Henna Pietarinen,
Tommi Kaplas,
Martti Kauranen,
Goëry Genty
Publication year - 2013
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.002012
Subject(s) - materials science , silicon nitride , grating , optoelectronics , optics , waveguide , silicon , second harmonic generation , nitride , wavelength , nonlinear optics , nanotechnology , laser , physics , layer (electronics)
We report on strong UV third-harmonic generation from silicon nitride films and resonant waveguide gratings. We determine the absolute value of third-order susceptibility of silicon nitride at wavelength of 1064 nm to be χ(³) (-3ω,ω,ω,ω) = (2.8 ± 0.6) × 10⁻²⁰m²/V², which is two orders of magnitude larger than that of fused silica. The third-harmonic generation is further enhanced by a factor of 2000 by fabricating a resonant waveguide grating onto a silicon nitride film. Our results extend the operating range of CMOS-compatible nonlinear materials to the UV spectral regime.