Open AccessA compact and low loss Y-junction for submicron silicon waveguide
Author(s) -
Yi Zhang,
Shaoshi Yang,
Andy Eu-Jin Lim,
GuoQiang Lo,
Christophe Galland,
Tom BaehrJones,
Michael Hochberg
Publication year - 2013
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.001310
Subject(s) - insertion loss , materials science , optics , finite difference time domain method , wafer , waveguide , astronomical interferometer , silicon , footprint , optoelectronics , silicon on insulator , semiconductor device fabrication , cmos , multi mode optical fiber , interferometry , optical fiber , physics , paleontology , biology
We designed a compact, low-loss and wavelength insensitive Y-junction for submicron silicon waveguide using finite difference time-domain (FDTD) simulation and particle swarm optimization (PSO), and fabricated the device in a 248 nm complementary metal-oxide-semiconductor (CMOS) compatible process. Measured average insertion loss is 0.28 ± 0.02 dB, uniform across an 8-inch wafer. The device footprint is less than 1.2 μm x 2 μm, an order of magnitude smaller than typical multimode interferometers (MMIs) and directional couplers.