Open AccessDirect electrical contact of slanted ITO film on axial p-n junction silicon nanowire solar cells
Author(s) -
Ya Ju Lee,
Yung Chi Yao,
Chia Hao Yang
Publication year - 2012
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.0000a7
Subject(s) - materials science , indium tin oxide , doping , optoelectronics , silicon , solar cell , chemical vapor deposition , electrical resistivity and conductivity , energy conversion efficiency , electrical contacts , p–n junction , short circuit , solar cell efficiency , electrode , open circuit voltage , optics , thin film , nanotechnology , voltage , semiconductor , electrical engineering , chemistry , physics , engineering
A novel scheme of direct electrical contact on vertically aligned silicon nanowire (SiNW) axial p-n junction is demonstrated by means of oblique-angle deposition of slanted indium-tin-oxide (ITO) film for photovoltaic applications. The slanted ITO film exhibits an acceptable resistivity of 1.07 x 10⁻³Ω-cm underwent RTA treatment of T = 450°C, and the doping concentration and carrier mobility by Hall measurement amount to 3.7 x 10²⁰ cm⁻³ and 15.8 cm²/V-s, respectively, with an n-type doping polarity. Because of the shadowing effect provided by the SiNWs, the incident ITO vapor-flow is deposited preferentially on the top of SiNWs, which coalesces and eventually forms a nearly continuous film for the subsequent fabrication of grid electrode. Under AM 1.5 G normal illumination, our axial p-n junction SiNW solar cell exhibits an open circuit voltage of VOC = 0.56 V, and a short circuit current of JSC = 1.54 mA/cm² with a fill factor of FF = 30%, resulting in a total power conversion efficiency of PEC = 0.26%.