Open AccessDemonstration of up-conversion fluorescence from Ar clusters in intense free-electron-laser fields
Author(s) -
Hiroshi Iwayama,
Mitsuru Nagasono,
James Harries,
E. Shigemasa
Publication year - 2012
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.20.023174
Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , free electron laser , optics , laser , fluorescence , wavelength , ion , atomic physics , physics , materials science , electron , excitation , quantum mechanics
Extreme ultraviolet (EUV) fluorescence emitted from Ar clusters irradiated by intense EUV free electron laser (FEL) pulses has been investigated. The EUV fluorescence spectra display rich structure at wavelengths shorter than the incident FEL wavelength of 51 nm. The results suggest that multiply-charged ions are produced following the ion-electron recombination processes which occur in the nanoplasma created by multi-photon excitation during the intense EUV-FEL pulses.