Open AccessHigh quality factor 1-D Er^3+-activated dielectric microcavity fabricated by RF-sputtering
Author(s) -
Sreeramulu Valligatla,
Alessandro Chiasera,
Stefano Varas,
Nicola Bazzanella,
D. Narayana Rao,
Giancarlo C. Righini,
Maurizio Ferrari
Publication year - 2012
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.20.021214
Subject(s) - materials science , scanning electron microscope , transmittance , optics , q factor , sputtering , dielectric , photonic crystal , optoelectronics , thin film , resonator , nanotechnology , physics , composite material
Rare earth-activated 1-D photonic crystals were fabricated by RF-sputtering technique. The cavity is constituted by an Er3+-doped SiO2 active layer inserted between two Bragg reflectors consisting of ten pairs of SiO2/TiO2 layers. Scanning electron microscopy is employed to put in evidence the quality of the sample, the homogeneities of the layers thickness and the good adhesion among them. Near infrared transmittance and variable angle reflectance spectra confirm the presence of a stop band from 1500 nm to 2000 nm with a cavity resonance centered at 1749 nm at 0° and a quality factor of 890. The influence of the cavity on the ⁴I₁₃/₂ -->⁴I₁₅/₂ emission band of Er3+ ion is also demonstrated.