Open AccessDurability of stochastic antireflective structures - analyses on damage thresholds and adsorbate elimination
Author(s) -
M. Schulze,
Michael Damm,
Michael Helgert,
ErnstBernhard Kley,
Stefan Nolte,
Andreas Tünnermann
Publication year - 2012
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.20.018348
Subject(s) - anti reflective coating , materials science , irradiation , annealing (glass) , laser , optics , x ray photoelectron spectroscopy , wavelength , stack (abstract data type) , optoelectronics , durability , layer (electronics) , composite material , chemical engineering , physics , computer science , nuclear physics , programming language , engineering
We fabricated stochastic antireflective structures (ARS) and analyzed their stability against high power laser irradiation and high temperature annealing. For 8 ps pulse duration and 1030 nm wavelength we experimentally determined their laser induced damage threshold to 4.9 (±0.3) J/cm(2), which is nearly as high as bulk fused silica with 5.6 (±0.3) J/cm(2). A commercial layer stack reached 2.0 (±0.2) J/cm(2). An annealing process removed adsorbed organics, as shown by XPS measurements, and significantly increased the transmission of the ARS. Because of their monolithic build the ARS endure such high temperature treatments. For more sensitive samples an UV irradiation proved to be capable. It decreased the absorbed light and reinforced the transmission.