Open AccessInfluence of self-absorption on plasma diagnostics by emission spectral lines
Author(s) -
Evgueni Gudimenko,
Vladimir Milosavljević,
Stephen Daniels
Publication year - 2012
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.20.012699
Subject(s) - argon , plasma , emission spectrum , actinometer , materials science , plasma diagnostics , absorption spectroscopy , absorption (acoustics) , atomic physics , spectroscopy , spectral line , plasma parameters , optics , physics , quantum mechanics , astronomy , composite material
Accurate optical emission spectroscopy (OES) measurements are necessary for plasma semiconductor processing and for optical emission analysis. In this paper we investigate the effects of self-absorption on the most important neutral Argon spectra lines. One of these Argon spectral lines (750 nm) is frequently used for actinometry. The experiment is performed in a reactive ion etch (RIE) capacitively coupled plasma (CCP) system. A comprehensive design of experiments has been created to establish all plasma conditions, power, pressure and gas flow rate which affect the Argon emission intensity by self-absorption. The results are then compared to theoretical calculated line ratios.