Open AccessLoss mechanisms of surface plasmon polaritons propagating on a smooth polycrystalline Cu surface
Author(s) -
Hyun Seok Lee,
Chawki Awada,
Salim Boutami,
Fabrice Charra,
Ludovic Douillard,
R. Espiau de Lamaëstre
Publication year - 2012
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.20.008974
Subject(s) - surface plasmon polariton , surface plasmon , materials science , optics , localized surface plasmon , plasmon , polariton , wavelength , optoelectronics , photoemission electron microscopy , nanophotonics , electron microscope , physics
We study the propagation properties of surface plasmon polaritons on a Cu surface by means of photoemission electron microscopy. Use of a CMOS process to fabricate the Cu thin film is shown to enable very high propagation distances (up to 65 μm at 750 nm wavelength), provided that the copper native oxide is removed. A critical review of the optical loss mechanisms is undertaken and shed light on the effect of single grain boundaries in increasing the propagation losses of the plasmon. A microscopic interpretation is provided, relying on groove induced electromagnetic hot spots.