Open AccessExtreme ultraviolet light source based on intracavity high harmonic generation in a mode locked Ti:sapphire oscillator with 94 MHz repetition rate
Author(s) -
E. Seres,
J. Seres,
Christian Spielmann
Publication year - 2012
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.20.006185
Subject(s) - optics , extreme ultraviolet , laser , sapphire , high harmonic generation , extreme ultraviolet lithography , materials science , harmonics , ti:sapphire laser , harmonic , physics , optoelectronics , voltage , quantum mechanics
We report on the realization of an intracavity high harmonic source with a cutoff above 30 eV. The EUV source is based on a high power, hard-aperture, Kerr-lens mode-locked Ti:sapphire oscillator with a repetition rate of 9.4 MHz. The laser is operated in the net negative dispersion regime resulting in intracavity pulses as short as 17 fs with 1 µJ pulse energy. In a second intracavity focus, intensity more than 10¹⁴ W/cm² has been achieved, which is sufficient for high harmonic generation in a Xenon gas jet.