Extreme ultraviolet light source based on intracavity high harmonic generation in a mode locked Ti:sapphire oscillator with 94 MHz repetition rate | Zendy

E. Seres | Zendy; J. Seres | Zendy; Christian Spielmann | Zendy

Open Access

Extreme ultraviolet light source based on intracavity high harmonic generation in a mode locked Ti:sapphire oscillator with 94 MHz repetition rate

Author(s) -

E. Seres,

J. Seres,

Christian Spielmann

Publication year - 2012

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.20.006185

Subject(s) - optics , sapphire , laser , high harmonic generation , extreme ultraviolet , materials science , extreme ultraviolet lithography , harmonics , harmonic , lens (geology) , physics , optoelectronics , voltage , quantum mechanics

We report on the realization of an intracavity high harmonic source with a cutoff above 30 eV. The EUV source is based on a high power, hard-aperture, Kerr-lens mode-locked Ti:sapphire oscillator with a repetition rate of 9.4 MHz. The laser is operated in the net negative dispersion regime resulting in intracavity pulses as short as 17 fs with 1 µJ pulse energy. In a second intracavity focus, intensity more than 10¹⁴ W/cm² has been achieved, which is sufficient for high harmonic generation in a Xenon gas jet.

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