Open AccessAdvanced broadband monitoring for thin film deposition through equivalent optical admittance loci observation
Author(s) -
Kai Wu,
Cheng-Chung Lee,
Tzu-Ling Ni
Publication year - 2012
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.20.003883
Subject(s) - admittance , refractive index , optics , broadband , materials science , thin film , compensation (psychology) , deposition (geology) , refraction , optoelectronics , physics , electrical impedance , psychology , paleontology , quantum mechanics , sediment , psychoanalysis , nanotechnology , biology
A monitoring technique using the equivalent optical admittance loci of thin films to control the deposition is presented. Real-time broadband spectrum measurements are employed to extract the real-time thin film refraction index and thickness, and the corresponding equivalent optical admittance is thereby obtained. This monitoring method can predict the termination point of the deposition process and avoid the termination ambiguities, which generally appear with other broadband monitors. Compared to other monitoring methods, the experimental results of the proposed monitoring technique show better error compensation ability.