Open AccessOptical and electrical study of core-shell silicon nanowires for solar applications
Author(s) -
Zhenhua Li,
Jian Wang,
Navab Singh,
Sungjoo Lee
Publication year - 2011
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.19.0a1057
Subject(s) - materials science , energy conversion efficiency , wafer , optoelectronics , equivalent series resistance , etching (microfabrication) , crystalline silicon , fabrication , silicon , optics , lithography , solar cell , planar , voltage , nanotechnology , medicine , physics , alternative medicine , computer graphics (images) , layer (electronics) , quantum mechanics , pathology , computer science
In this work, we report a CMOS comparable fabrication process of core-shell SiNW solar cell from single-crystalline p-type Si(100) test wafers. Optical lithography defined plasma etching was used to form highly ordered vertical SiNW arrays, which display a drastic reduction in optical reflectance over a wide range of wavelengths. BF(2) and P ion implantations were employed for producing a sharp and shallow radial p-n junction. Under AM 1.5G illumination, the device demonstrates a short circuit current density (Jsc) of 14.2 mA/cm(2), an open circuit voltage (Voc) of 0.485 V and a fill factor (FF) of 42.9%, giving a power conversion efficiency (PCE) of 2.95%. The Jsc observed is 52% higher than that in the control device with planar Si p-n junction, indicating significant enhancement in carrier generation and collection efficiency from the core-shell structure. Impact of series resistance (Rs) is also studied, highlighting potential improvement of PCE to 4.40% in the absence of Rs. With top contact optimized, PCE could further increase to 6.29%.