Open AccessBroadband antireflection and absorption enhancement by forming nano-patterned Si structures for solar cells
Author(s) -
Y. Liu,
Shantong Sun,
Jun Xu,
Le Zhao,
Hongcheng Sun,
J. Li,
Weiwei Mu,
Ling Xu,
K. J. Chen
Publication year - 2011
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.19.0a1051
Subject(s) - materials science , optoelectronics , optics , absorption (acoustics) , nano , energy conversion efficiency , solar cell , reflection (computer programming) , substrate (aquarium) , amorphous solid , oceanography , physics , chemistry , organic chemistry , computer science , composite material , programming language , geology
In this letter, we report the antireflection and light absorption enhancement by forming sub-wavelength nano-patterned Si structures via nano-sphere lithography technique. It is found that the surface reflection can be significantly suppressed in a wide spectral range (400-1000 nm) and the weighted mean reflection is less than 5%. Meanwhile, the broad band optical absorption enhancement is achieved consequently. Heterojunction solar cells are prepared by depositing ultrathin amorphous Si film on the nano-patterned Si structures, the short circuit current density increases to 37.2 mA/cm(2)and the power conversion efficiency is obviously improved compared to the reference cell on flat Si substrate.