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Antireflection effect of femtosecond laser-induced periodic surface structures on silicon
Author(s) -
A. S. Vorobyev,
Guo Chen
Publication year - 2011
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.19.0a1031
Subject(s) - materials science , femtosecond , optics , laser , wafer , silicon , specular reflection , wavelength , optoelectronics , grating , physics
Following direct femtosecond laser pulse irradiation, we produce a unique grating structure over a large area superimposed by finer nanostructures on a silicon wafer. We study, for the first time, the antireflection effect of this femtosecond laser-induced periodic surface structures (FLIPSSs) in the wavelength range of 250 - 2500 nm. Our study shows that the FLIPSSs suppress both the total hemispherical and specular polarized reflectance of silicon surface significantly over the entire studied wavelength range. The total polarized reflectance of the processed surface is reduced by a factor of about 3.5 in the visible and 7 in the UV compared to an untreated sample. The antireflection effect of the FLIPSS surface is broadband and the suppression stays to the longest wavelength (2500 nm) studied here although the antireflection effect in the infrared is weaker than in the visible. Our FLIPSS structures are free of chemical contamination, highly durable, and easily controllable in size.

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