Open AccessThermoluminescence at a heating rate threshold in stressed fused silica
Author(s) -
Philippe Bouchut,
F. Milési,
Céline Da Maren
Publication year - 2011
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.19.025854
Subject(s) - thermoluminescence , materials science , optics , laser , annealing (glass) , thermal , incandescence , irradiation , laser beams , optoelectronics , combustion , composite material , luminescence , chemistry , physics , organic chemistry , meteorology , nuclear physics , soot
The emissive properties of proton implanted fused silica surfaces have been studied by laser beam annealing. When submitted to a high thermal step from a focused CO2 laser, an intense near infra-red transient incandescence (TI) peak rises from stressed silica. The TI presents the characteristics of a thermoluminescent (TL) emission that occurs above a thermal rate threshold. We show that TI rises at the stress relaxation.