Thermoluminescence at a heating rate threshold in stressed fused silica | Zendy

Philippe Bouchut | Zendy; F. Milési | Zendy; Céline Da Maren | Zendy

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Thermoluminescence at a heating rate threshold in stressed fused silica

Author(s) -

Philippe Bouchut,

F. Milési,

Céline Da Maren

Publication year - 2011

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.19.025854

Subject(s) - thermoluminescence , materials science , optics , laser , annealing (glass) , thermal , incandescence , irradiation , laser beams , optoelectronics , combustion , composite material , luminescence , chemistry , physics , organic chemistry , meteorology , nuclear physics , soot

The emissive properties of proton implanted fused silica surfaces have been studied by laser beam annealing. When submitted to a high thermal step from a focused CO2 laser, an intense near infra-red transient incandescence (TI) peak rises from stressed silica. The TI presents the characteristics of a thermoluminescent (TL) emission that occurs above a thermal rate threshold. We show that TI rises at the stress relaxation.

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