Open AccessStand-alone diamond binary phase transmission gratings for the EUV band
Author(s) -
Christoph Braig,
Thomas Käsebier,
ErnstBernhard Kley,
Andreas Tünnermann
Publication year - 2011
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.19.014008
Subject(s) - optics , materials science , extreme ultraviolet lithography , electron beam lithography , diamond , beamline , optoelectronics , lithography , diffraction grating , wafer , diffraction , phase (matter) , synchrotron , wavelength , beam (structure) , resist , physics , nanotechnology , layer (electronics) , quantum mechanics , composite material
We report on the development of true free-standing phase transmission gratings for the extreme ultraviolet band. An ultra-nanocrystalline, 300 nm thin diamond film on a backside etched silicon wafer is structured by electron-beam lithography to periods of 1 μm. In this way, flat and stable gratings of 400 μm in diameter are fabricated. First-order net efficiencies up to 28% are obtained from measurements at a synchrotron beamline within a wavelength range from 5.0 nm to 8.3 nm, whereas the 0th order is suppressed to 1% near 6.8 nm. Higher diffraction orders up to the 3rd one contribute less than 7% in sum to the far-field pattern.