
Si micro-ring MUX/DeMUX WDM filters
Author(s) -
Sahnggi Park,
Kap-Joong Kim,
In-Gyoo Kim,
Gyungock Kim
Publication year - 2011
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.19.013531
Subject(s) - multiplexer , photolithography , wavelength division multiplexing , optics , materials science , optical filter , wavelength , fabrication , ring (chemistry) , optoelectronics , radius , channel (broadcasting) , channel spacing , physics , computer science , telecommunications , multiplexing , chemistry , medicine , alternative medicine , organic chemistry , computer security , pathology
We demonstrate 3rd order micro-ring filters, 100 GHz-spaced 16 channels and 50 GHz-spaced 32 channels. Fabrication-induced resonant wavelength errors, σ = 0.237 nm, and temperature-dependent wavelength shift, 0.043 nm/°C tolerable to ΔT>10 °C, has been measured on filters based on the fundamental TM mode. The problem of CMOS-compatible photolithography is solved, while maintaining a small radius, R = 9 μm. As some dummy channels are arranged, it is shown that an on-chip optical network for many cores CPU can be constructed by 16 channel ring filters with the currently available technology.