Open AccessApplication of image spectrometer to in situ infrared broadband optical monitoring for thin film deposition
Author(s) -
Qing-Yuan Cai,
Yuanzhou Zheng,
Dongxu Zhang,
Weijie Lü,
Rongjun Zhang,
Wei Lin,
Haibin Zhao,
LiangYao Chen
Publication year - 2011
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.19.012969
Subject(s) - optics , materials science , spectrometer , thin film , deposition (geology) , full width at half maximum , optical path , refractive index , infrared , optical filter , detector , optoelectronics , physics , nanotechnology , paleontology , sediment , biology
A path-folded infrared image spectrometer with five sub-gratings and five linear-array detectors was applied to a broadband optical monitoring (BOM) system for thin film deposition. Through in situ BOM, we can simultaneously acquire the thickness and refractive index of each layer in real time by fitting the measured spectra, and modify the deposition parameters during deposition process according to the fitting results. An effective data processing method was proposed and applied in the BOM process, and it shortened the data processing time and improved the monitoring efficiency greatly. For demonstration, a narrow band-pass filter (NBF) at 1540 nm with ~10 nm full width at half-maximum (FWHM) had been manufactured using the developed BOM system, and the results showed that this BOM method was satisfying for monitoring deposition of thin film devices.