Open AccessDetermination of the evolution of layer thickness errors and interfacial imperfections in ultrathin sputtered Cr/C multilayers using high-resolution transmission electron microscopy
Author(s) -
Hui Jiang,
A. G. Michette,
Sławka J. Pfauntsch,
Zhanshan Wang,
Jingtao Zhu,
Dehui Li
Publication year - 2011
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.19.011815
Subject(s) - transmission electron microscopy , materials science , optics , layer (electronics) , surface finish , resolution (logic) , surface roughness , high resolution transmission electron microscopy , microscopy , electron microscope , optical microscope , sputtering , scanning electron microscope , thin film , composite material , nanotechnology , physics , artificial intelligence , computer science
The structures of ultrathin sputtered Cr/C multilayers were determined by high-resolution transmission electron microscopy. The evolution of layer thickness errors, interdiffusion and interfacial roughness were simulated using time series models. The results show that with increasing of interdiffusion and roughness the multilayer thickness ratio changes, thereby influencing the optical performance. All structural parameters show good correlation with and influence adjacent layers. The system errors of the deposition equipment can also be evaluated by the models.