Open AccessA 50nm spatial resolution EUV imaging–resolution dependence on object thickness and illumination bandwidth
Author(s) -
P. Wachulak,
Andrzej Bartnik,
Henryk Fiedorowicz,
J. Kostecki
Publication year - 2011
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.19.009541
Subject(s) - extreme ultraviolet lithography , optics , image resolution , extreme ultraviolet , microscope , resolution (logic) , bandwidth (computing) , radiation , materials science , physics , microscopy , laser , computer science , telecommunications , artificial intelligence
In this paper we report a desk-top microscopy reaching 50 nm spatial resolution in very compact setup using a gas-puff laser plasma EUV source. The thickness of an object and the bandwidth of illuminating radiation were studied in order to estimate their quantitative influence on the EUV microscope spatial resolution. EUV images of various thickness objects obtained by illumination with variable bandwidth EUV radiation were compared in terms of knife-edge spatial resolution to study the bandwidth/object thickness parasitic influence on spatial resolution of the EUV microscope.