Open AccessOptimized electron beam writing strategy for fabricating computer-generated holograms based on an effective medium approach
Author(s) -
Wiebke Freese,
Thomas Kämpfe,
Werner Rockstroh,
ErnstBernhard Kley,
Andreas Tünnermann
Publication year - 2011
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.19.008684
Subject(s) - holography , optics , lithography , binary number , electron beam lithography , computer science , materials science , computer generated holography , fabrication , phase (matter) , process (computing) , resist , optoelectronics , nanotechnology , physics , medicine , arithmetic , mathematics , layer (electronics) , alternative medicine , pathology , quantum mechanics , operating system
Recent research revealed that using the effective medium approach to generate arbitrary multi-phase level computer-generated holograms is a promising alternative to the conventional multi-height level approach. Although this method reduces the fabrication effort using one-step binary lithography, the subwavelength patterning process remains a huge challenge, particularly for large-scale applications. To reduce the writing time on variable shaped electron beam writing systems, an optimized strategy based on an appropriate reshaping of the binary subwavelength structures is illustrated. This strategy was applied to fabricate a three-phase level CGH in the visible range, showing promising experimental results.