Open AccessTunable ultra-deep subwavelength photolithography using a surface plasmon resonant cavity
Author(s) -
Weihao Ge,
Chinhua Wang,
Yinfei Xue,
Bing Cao,
Baoshun Zhang,
Ke Xu
Publication year - 2011
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.19.006714
Subject(s) - materials science , surface plasmon , photoresist , optics , photolithography , plasmon , surface plasmon polariton , grating , nanolithography , localized surface plasmon , optoelectronics , layer (electronics) , nanophotonics , interferometry , surface plasmon resonance , nanotechnology , fabrication , physics , medicine , alternative medicine , pathology , nanoparticle
Using numerical simulations, we report an observation of a novel tunable ultra-deep subwavelength nanolithography technique using a surface plasmon resonant cavity formed by a metallic grating and a metallic thin-film layer separated by a photoresist layer. The tuning capability is implemented by varying the cavity length, from which surface plasmon interferometric patterns with inherently higher optical resolution than that of conventional surface plasmon techniques are generated in the cavity of photoresist layer. The physical origin of the tunability is analytically confirmed by the dispersion relation derived from the cavity system.