Open AccessA multi-layer electro-optic field probe
Author(s) -
Dong Joon Lee,
Jong-Kee Kwon,
HoSung Ryu,
J.F. Whitaker
Publication year - 2010
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.18.024735
Subject(s) - optics , wafer , interferometry , materials science , stack (abstract data type) , interference (communication) , electric field , calibration , sensitivity (control systems) , layer (electronics) , modulation (music) , optoelectronics , physics , electronic engineering , computer science , nanotechnology , telecommunications , acoustics , channel (broadcasting) , quantum mechanics , programming language , engineering
We present a novel design method and sensing scheme for an electro-optic field probe using multi-stratified layers of electro-optic wafers. A serial stack of cascaded layers is found to be capable of enhancing the performance of interferometric electro-optic light modulation that utilizes the slopes of interference fringe patterns and field-induced electro-optic phase retardations within wafers. The absolute sensitivity of the probe is also characterized with a micro-TEM cell that generates electric fields distributions with accurate, calculable strength for use in probe calibration. The sensitivity of a multi-layered probe-per unit electro-optic wafer volume--was enhanced by 6 dB compared to that of a single-layer one.