Open AccessAdvanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect
Author(s) -
Lorenz Stuerzebecher,
Torsten Harzendorf,
Uwe Vogler,
Uwe D. Zeitner,
Reinhard Voelkel
Publication year - 2010
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.18.019485
Subject(s) - optics , photomask , talbot effect , lithography , pinhole (optics) , photoresist , diffraction , photolithography , fabrication , materials science , x ray lithography , fresnel diffraction , computational lithography , resist , optoelectronics , physics , nanotechnology , medicine , alternative medicine , layer (electronics) , pathology
The Talbot effect is utilized for micro-fabrication of periodic microstructures via proximity lithography in a mask aligner. A novel illumination system, referred to as MO Exposure Optics, allows to control the effective source shape and accordingly the angular spectrum of the illumination light. Pinhole array photomasks are employed to generate periodic high-resolution diffraction patterns by means of self-imaging. They create a demagnified image of the effective source geometry in their diffraction pattern which is printed to photoresist. The proposed method comprises high flexibility and sub-micron resolution at large proximity gaps. Various periodic structures have been generated and are presented.