Open AccessSubwavelength grating crossings for silicon wire waveguides
Author(s) -
Przemek J. Bock,
Pavel Cheben,
Jens H. Schmid,
J. Lapointe,
A. Delâge,
DanXia Xu,
Siegfried Janz,
A. Densmore,
Trevor J. Hall
Publication year - 2010
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.18.016146
Subject(s) - optics , grating , polarization (electrochemistry) , materials science , silicon , crosstalk , waveguide , insertion loss , finite difference time domain method , diffraction grating , optoelectronics , physics , chemistry
We report on the design, simulation and experimental demonstration of a new type of waveguide crossing based on subwavelength gratings in silicon waveguides. We used 3D finite-difference time-domain simulations to minimize loss, crosstalk and polarization dependence. Measurement of fabricated devices show that our waveguide crossings have a loss as low as -0.023 dB/crossing, polarization dependent loss of < 0.02 dB and crosstalk <-40 dB.