Open AccessA practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique
Author(s) -
Mingyang He,
Zhiyou Zhang,
Sha Shi,
Jinglei Du,
Xupeng Li,
Shuhong Li,
Wenying Ma
Publication year - 2010
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.18.015975
Subject(s) - interference lithography , surface plasmon polariton , interference (communication) , materials science , optics , lithography , nanolithography , surface plasmon , prism , optoelectronics , coupling (piping) , total internal reflection , reflection (computer programming) , polariton , plasmon , physics , fabrication , computer science , medicine , computer network , channel (broadcasting) , alternative medicine , pathology , metallurgy , programming language
For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside -exposure method are studied and the interference fringes with feature size below 65 nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid.