Open AccessLight induced patterning of poly(dimethylsiloxane) microstructures
Author(s) -
Lisa Miccio,
Melania Paturzo,
Andrea Fińizio,
Pietro Ferraro
Publication year - 2010
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.18.010947
Subject(s) - materials science , lithium niobate , fabrication , lithography , microstructure , photorefractive effect , optics , substrate (aquarium) , soft lithography , nanotechnology , resist , photolithography , optoelectronics , composite material , medicine , oceanography , alternative medicine , physics , pathology , layer (electronics) , geology
A new method for direct patterning of Poly(dimethylsiloxane) (PDMS) microstructures is developed by taking advantage of photorefractive effect in a functionalized substrate. Here we show that when a x-cut Iron doped Lithium Niobate (LN) crystal is exposed to appropriate structured laser light, a charge density pattern builds-up in the crystal and a space charge field arise that is able to induce self-patterning of the PDMS liquid film deposited on its surface via the dielectrophoretic effects. Proper heating treatment allows to achieve polymeric linking process creating a solid and stable PDMS microstructures. The self-patterned structures replicate the illuminating light pattern. We show that 1D and 2D patterning of PDMS gratings can be achieved. This new soft-lithographic approach can pave the way for realizing PDMS micro-structures with high degree of flexibility that avoids the need of moulds fabrication.