Open AccessLateral shift effect on the spatial interference of light wave propagating in the single-layered dielectric film
Author(s) -
Yuan Zhao,
Ming-Yu Sheng,
Yuanzhou Zheng,
Min Xu,
Haibin Zhao,
LiangYao Chen
Publication year - 2010
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.18.010524
Subject(s) - optics , interference (communication) , dielectric , materials science , ellipsometry , reflection coefficient , reflection (computer programming) , total internal reflection , refractive index , fresnel equations , spatial frequency , physics , thin film , optoelectronics , telecommunications , computer science , channel (broadcasting) , programming language , nanotechnology
Under the oblique incidence condition, the multiple reflection of wave packets in a layered film structure will have a lateral shift increasing with the film thickness. In the analysis of the spatial interference with consideration of the lateral shift effect, a set of new analytic formulae to normalize the intensity of the s-and p-polarized wave packet was obtained to reduce the error of the ellipsometry parameters significantly as the optical path difference delta is close to mpi. The principle and method developed in this work also can be applied to other film structures in more general applications.