Open AccessReflectometer-based metrology for high-aspect ratio via measurement
Author(s) -
Yi-Sha Ku,
Fu Shiang Yang
Publication year - 2010
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.18.007269
Subject(s) - metrology , optics , wafer , materials science , bidirectional reflectance distribution function , measure (data warehouse) , dimensional metrology , accuracy and precision , reflectivity , optoelectronics , computer science , physics , quantum mechanics , database
We develop a modified thin film model with adjustable ratio of the illuminated surface areas for accurate reflectivity calculation of deep via structures. We also propose a method combining a half oblate spheroid model and a reflectance modulation algorithm for extraction of via bottom profile from the measured reflectance spectrum. We demonstrate the use and enhancement of an existing wafer metrology tool, spectral reflectometer by implementing novel theoretical model and measurement algorithm for through-silicon via (TSV) inspection. Our non-destructive solution can measure TSV profile diameters as small as 5 microm and aspect ratios greater than 13:1. The measurement precision is in the range of 0.02 microm. Metrology results from actual 3D interconnect processing wafers are presented.