Open AccessNear-field ellipsometry for thin film characterization
Author(s) -
Zhuang Liu,
Ying Zhang,
Shaw Wei Kok,
Boon Poh Ng,
Yeng Chai Soh
Publication year - 2010
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.18.003298
Subject(s) - optics , near field scanning optical microscope , characterization (materials science) , ellipsometry , materials science , thin film , image resolution , field (mathematics) , near and far field , optical microscope , nanotechnology , physics , scanning electron microscope , mathematics , pure mathematics
A near-field ellipsometry method is presented for nano-scale thin film characterization. The technique fuses the topographic and ellipso-metric optical measurements that are simultaneously obtained by a scanning near-field optical microscopy (SNOM). It is shown that the proposed near-field ellipsometry is able to attain nano-scale lateral resolution and correct artifacts in characterization. The effectiveness of the proposed method is verified by simulation and experimental studies.