Near-field ellipsometry for thin film characterization | Zendy

Zhuang Liu | Zendy; Ying Zhang | Zendy; Shaw Wei Kok | Zendy; Boon Ping Ng | Zendy; Yeng Chai Soh | Zendy

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Near-field ellipsometry for thin film characterization

Author(s) -

Zhuang Liu,

Ying Zhang,

Shaw Wei Kok,

Boon Ping Ng,

Yeng Chai Soh

Publication year - 2010

Publication title -

optics express

Language(s) - Uncategorized

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.18.003298

Subject(s) - optics , near field scanning optical microscope , characterization (materials science) , ellipsometry , materials science , thin film , image resolution , field (mathematics) , near and far field , optical microscope , nanotechnology , physics , scanning electron microscope , mathematics , pure mathematics

A near-field ellipsometry method is presented for nano-scale thin film characterization. The technique fuses the topographic and ellipso-metric optical measurements that are simultaneously obtained by a scanning near-field optical microscopy (SNOM). It is shown that the proposed near-field ellipsometry is able to attain nano-scale lateral resolution and correct artifacts in characterization. The effectiveness of the proposed method is verified by simulation and experimental studies.

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