Open AccessMTMO grayscale photomask
Author(s) -
Chuan Fei Guo,
Jianming Zhang,
Junjie Miao,
Fan Yang,
Qian Liu
Publication year - 2010
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.18.002621
Subject(s) - photomask , grayscale , materials science , optics , nanometre , laser , optoelectronics , nanotechnology , resist , pixel , composite material , physics , layer (electronics)
We present a new class of simple, cheap and stable grayscale photomasks based on the metal-transparent-metallic-oxides (MTMO) systems by laser direct writing in metal films. For obtaining high resolution and grainless grayscale patterns we developed a refinement method of the films, in which the nanometer size effect may play a significant role for the improvement. We propose a layered oxidation model and a grain model for the mechanism of In- and Sn-based MTMO systems. The masks have a wide application wavelength range at least from 350 to 700 nm. Three-dimensional microstructures have been successfully fabricated by using the MTMO grayscale masks.