Open AccessOptical emission enhancement using laser ablation combined with fast pulse discharge
Author(s) -
Weidong Zhou,
Kexue Li,
Qinmei Shen,
Qiaoling Chen,
Jie Long
Publication year - 2010
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.18.002573
Subject(s) - materials science , laser , ablation , optics , emission spectrum , laser ablation , signal (programming language) , plasma , laser induced breakdown spectroscopy , voltage , optoelectronics , spectral line , physics , quantum mechanics , astronomy , aerospace engineering , computer science , programming language , engineering
In this paper, a high voltage and fast pulse discharge circuit is developed and combined with laser ablation to enhance optical emission from Si crystal. The new characters of the discharge circuit and its effect on the plasma emission are presented. Characterizing by a damping and periodical oscillating discharge voltage and current with a short period of approximately 0.5 micros, the discharge automatically occurs approximately 1 micros after laser ablation. Significant optical emission enhancement, up to 52 times improved signal intensity relative to the signal in the absence of the discharge spark, is observed. Better line stability in terms of relative standard deviation and improved signal to noise (S/N) ratio are also achieved. The enhanced line intensity with better stability and S/N ratio, similar with the observation when using double-pulse laser induced breakdown spectroscopy (DP-LIBS), probably will benefit element analysis in the future.