
Improvement of linewidth in laser beam lithographed computer generated hologram
Author(s) -
Hyug-Gyo Rhee,
Yun-Woo Lee
Publication year - 2010
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.18.001734
Subject(s) - optics , laser linewidth , lens (geology) , holography , diffraction , lithography , beam (structure) , laser , materials science , point spread function , laser beam quality , laser beams , physics
We propose a new laser lithographic technique with enhanced resolution. A calcite wave plate is introduced in our system to separate an input lithographic beam into two orthogonally polarized beams. After going through an imaging lens, these two beams meet again on the focal point, and generate a small interferogram that sharpens the shape of the focused beam spot. Using this phenomenon, we can overcome the diffraction limit of the imaging lens and achieve a 486-nm-linewidth.