Open AccessCharacterization of nanostructured VO_2 thin films grown by magnetron controlled sputtering deposition and post annealing method
Author(s) -
Sihai Chen,
Jianjun Lai,
Jun Dai,
Hong Ma,
Hongchen Wang,
Xinjian Yi
Publication year - 2009
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.17.024153
Subject(s) - materials science , crystallite , thin film , sputter deposition , monoclinic crystal system , annealing (glass) , sputtering , scanning electron microscope , analytical chemistry (journal) , grain size , cavity magnetron , optics , optoelectronics , composite material , nanotechnology , crystallography , metallurgy , crystal structure , chemistry , physics , chromatography
By magnetron controlled sputtering system, a new nanostructured metastable monoclinic phase VO2 (B) thin film has been fabricated. The testing result shows that this nanostructured VO2 (B) thin film has high temperature coefficient of resistance (TCR) of -7%/K. Scanning electron microscopy measurement shows that the average grain diameter of the VO2 (B) crystallite is between 100 and 250 nm. After post annealed, VO2 (B) crystallite is changed into monoclinic (M) phase VO2 (M) crystallite with the average grain diameter between 20 and 50 nm. A set up of testing the thin film switching time is established. The test result shows the switching time is about 50 ms. With the nanostructured VO2 (B) and VO2 (M) thin films, optical switches and high sensitivity detectors will be presented.