Open AccessGrayscale photomask fabricated by laser direct writing in metallic nano-films
Author(s) -
Chuan Fei Guo,
Sihai Cao,
Peng Jiang,
Ying Fang,
Jianming Zhang,
Yang Fan,
Yongsheng Wang,
Wendong Xu,
Zongshan Zhao,
Liying Qian
Publication year - 2009
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.17.019981
Subject(s) - photomask , grayscale , materials science , laser , optics , lithography , microelectromechanical systems , maskless lithography , nanotechnology , optoelectronics , electron beam lithography , resist , pixel , physics , layer (electronics)
The grayscale photomask plays a key role in grayscale lithography for creating 3D microstructures like micro-optical elements and MEMS structures, but how to fabricate grayscale masks in a cost-effective way is still a big challenge. Here we present novel low cost grayscale masks created in a two-step method by laser direct writing on Sn nano-films, which demonstrate continuous-tone gray levels depended on writing powers. The mechanism of the gray levels is due to the coexistence of the metal and the oxides formed in a laser-induced thermal process. The photomasks reveal good technical properties in fabricating 3D microstructures for practical applications.