Electric-field-induced random lasing from ZnO and Mg_01Zn_09O films optically pumped with an extremely low intensity | Zendy

Peiliang Chen | Zendy; Xiangyang Ma | Zendy; Dongsheng Li | Zendy; Yuanyuan Zhang | Zendy; Deren Yang | Zendy

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Electric-field-induced random lasing from ZnO and Mg_01Zn_09O films optically pumped with an extremely low intensity

Author(s) -

Peiliang Chen,

Xiangyang Ma,

Dongsheng Li,

Yuanyuan Zhang,

Deren Yang

Publication year - 2009

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.17.018513

Subject(s) - lasing threshold , electric field , materials science , optics , laser , intensity (physics) , ultraviolet , optoelectronics , random laser , optical pumping , physics , quantum mechanics

Ultraviolet random lasing from ZnO and Mg(0.1)Zn(0.9)O films have been achieved under optical pump of a continuous wave He-Cd laser as the films are simultaneously exerted by an electric-field with appropriate polarity and amplitude. With the aid of electric-field, the optical pump intensity for generating random lasing can be reduced at least five orders of magnitude in comparison with conventional pulse-laser pumped ones. It is believed that the role of electric-field exerted on the films is similar to that of increasing optical pump intensity, in terms of increasing the amount of non-equilibrium electrons in the near-surface regions of films.

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