Open AccessPlasmonic interference nanolithography with a double-layer planar silver lens structure
Author(s) -
Beibei Zeng,
Xufeng Yuan,
Changtao Wang,
Xiangang Luo
Publication year - 2009
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.17.016783
Subject(s) - interference lithography , optics , lithography , interference (communication) , nanolithography , materials science , next generation lithography , surface plasmon , planar , plasmon , x ray lithography , stencil lithography , maskless lithography , photolithography , lens (geology) , plasmonic lens , nanoimprint lithography , optoelectronics , extreme ultraviolet lithography , surface plasmon polariton , fabrication , layer (electronics) , resist , electron beam lithography , nanotechnology , physics , telecommunications , computer science , channel (broadcasting) , alternative medicine , computer graphics (images) , pathology , medicine
We present here a surface plasmon interference lithography method with double-layer planar silver lens. This kind of lithography method provides interference patterns with sufficient contrast for lithography process and simple structure for the convenience of fabrication. Rigorous coupled wave analysis method has been performed with practical parameters to testify this lithography scheme. Furthermore, some key factors influencing the pattern quality have been discussed. It is pointed out that three factors mainly determine the resolution of the interference patterns, and therefore we give a theoretical resolution limit of about 1/12 wavelength to the surface plasmon interference lithography method.