Open AccessPhase-shift resolving confocal microscopy with high axial resolution, wide range and reflectance disturbance resistibility
Author(s) -
Jian Liu,
Jiubin Tan,
Chenguang Zhao,
Zhenggui Ge,
Daqing Zhang
Publication year - 2009
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.17.016281
Subject(s) - optics , materials science , interference microscopy , microscopy , resolution (logic) , confocal , main lobe , phase (matter) , grating , confocal microscopy , physics , telecommunications , quantum mechanics , artificial intelligence , computer science , antenna (radio)
A phase-shift resolving equation is established by combining the phase-shift interference and tomographic ability of a point detector. The theoretical measuring range of confocal microscopy is extended from the single-side linear range of an axial main lobe into the almost complete envelope of an axial main lobe, and the axial tomographic measurement is thus made resistible to the reflectance disturbance and power drift of a laser source. Experimental results indicate that the axial resolution is 0.5 nm and lateral precision for grating width measurement is 0.14 microm when NA=0.85 and lambda=632.8 nm. It can therefore be concluded that the proposed phase-shift resolving confocal microscopy can be used to achieve the high axial resolution, wide range and reflectance disturbance inhibition necessary for the measurement of microstructures made of different or hybrid material with high steps.