Open Access193nm Superlens Imaging Structure for 20nm Lithography Node
Author(s) -
ZhuPei Shi,
Vladimir Kochergin,
Fei Wang
Publication year - 2009
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.17.011309
Subject(s) - superlens , optics , lithography , resolution (logic) , wavelength , refractive index , materials science , depth of focus (tectonics) , rigorous coupled wave analysis , diffraction , physics , computer science , diffraction grating , subduction , artificial intelligence , biology , tectonics , paleontology
We are showing that a 20nm lithography resolution is theoretically feasible at a 193nm illumination wavelength if employing aluminum (Al) superlens structure with index matching layer. It is illustrated that transmissivity of evanescent waves for certain wavevector bands can be enhanced by an index matching layer. It is further shown a minimal resolution of approximately lambda/10 can be achieved by appropriately engineering mask material and superlens structure. A depth of focus of several nanometers is predicted to be possible for a periodic structure with 20nm half pitch. Assistant features were adopted in superlens structure to successfully suppress the side lobes and resolve a 20nm two-slit structure.