
Study of the new ellipsometric measurement method using integrated analyzer in parallel mode
Author(s) -
Peng-Hui Mao,
Yuanzhou Zheng,
Yue-Rui Chen,
Qing-Yuan Cai,
Rongjun Zhang,
LiangYao Chen
Publication year - 2009
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.17.008641
Subject(s) - spectrum analyzer , optics , azimuth , data acquisition , ellipsometry , measure (data warehouse) , materials science , light intensity , reliability (semiconductor) , physics , computer science , thin film , power (physics) , quantum mechanics , database , nanotechnology , operating system
A new type of ellipsometer using an integrated analyzer composed of 12 sub-analyzers with different azimuth angles was constructed and studied. By using a two-dimensional CCD array camera to measure the light intensity emerging in parallel from each sub-analyzer with the azimuth angles uniformly distributed in the range of about 180 degrees , the ellipsometric parameters were extracted within the data acquisition time less than 1 second. The ellipsometric parameters for the polished bulk Si sample were measured to show good agreement with the results measured by using another two ellipsometric methods. The new method having the merits of high speed and reliability in the optical data measurement can be potentially used in the fields where the in situ data acquisition with high precision is the key issue as required.