Open AccessTwo-dimensional photonic crystal color filter development
Author(s) -
Eun−Hyoung Cho,
Haesung Kim,
ByoungHo Cheong,
O. N. Prudnikov,
Wenxu Xianyua,
Jung Min Sohn,
Dong-Joon Ma,
HwanYoung Choi,
No−Cheol Park,
Young−Pil Park
Publication year - 2009
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.17.008621
Subject(s) - materials science , optics , photonic crystal , nanoimprint lithography , amorphous silicon , optoelectronics , color gel , optical filter , amorphous solid , silicon , wavelength , color filter array , lithography , crystalline silicon , layer (electronics) , nanotechnology , fabrication , medicine , chemistry , alternative medicine , physics , organic chemistry , pathology , thin film transistor
Reflective color filters using two-dimensional photonic crystals based on sub-wavelength gratings were proposed and constructed. Using low-cost nanoimprint lithography, an amorphous silicon layer was deposited through the low-temperature PECVD process and patterned into two-dimensional structures. The isolated amorphous silicon patterns were readily crystallized using a multi-shot excimer laser annealing at low energy. A study of the close relationship between color filter reflectance and silicon pattern crystallinity is introduced. Theoretical and experimental results show that the proposed color filters have high reflectance and, moreover, decrease the dependence on incident angle compared to one-dimensional photonic crystal color filters.