Open AccessEffect of surface manufacturing error of cubic phase mask in wavefront coding system
Author(s) -
Chuan-Chung Chang,
Cheng-Chung Lee
Publication year - 2009
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.17.006245
Subject(s) - optics , wavefront , point spread function , phase (matter) , materials science , surface (topology) , physics , mathematics , geometry , quantum mechanics
The degenerated performance of extend depth of field (EDoF) in wavefront coding system which using cubic phase mask is simulated. A periodical rotationally symmetric surface error structure is presented and combined with comparison the similarity of point spread function (PSF). The peak to valley (PV) error of the cubic surface is needed smaller than 15% compare with the sag of the cubic surface for low period error existed.