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Low loss etchless silicon photonic waveguides
Author(s) -
Jaime Cárdenas,
Carl B. Poitras,
Jacob T. Robinson,
Kyle Preston,
Long Chen,
Michal Lipson
Publication year - 2009
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.17.004752
Subject(s) - materials science , bend radius , optics , silicon , etching (microfabrication) , waveguide , radius , silicon photonics , bending , photonics , optoelectronics , physics , nanotechnology , composite material , computer security , layer (electronics) , computer science
We demonstrate low loss silicon waveguides fabricated without any silicon etching. We define the waveguides by selective oxidation which produces ultra-smooth sidewalls with width variations of 0.3 nm. The waveguides have a propagation loss of 0.3 dB/cm at 1.55 microm. The waveguide geometry enables low bending loss of approximately 0.007 dB/bend for a 90 degrees bend with a 50 microm bending radius.

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